R&D
Patent?for?invention?-Production method of ITO sputtering target
Patent?for?invention?-A preparation method of indium tin oxide composite powder
Patent for invention-Silicon nitride-based cermet mold and its preparation method
No | Name of invention patent |
---|---|
1 | A preparation method of indium tin oxide composite powder |
2 | A method of preparing ITO target by non - pressure sintering method |
3 | A preparation method of high dispersive ITO powder |
4 | A preparation method of high dispersive ITO powder |
5 | A preparation method for high sintering zinc oxide nanometer powder doped with aluminum |
6 | A method for preparation of high densification target mixed with zinc alumina |
7 | A method for preparing high-density ITO target by grouting |
8 | A method for preparing high-density AZO target by grouting |
9 | A method for preparation of indium tin mixed powder with high purity and high sintering activity |
10 | A preparation method of low cost and high density ITO target material |
11 | Powder and preparation method of high wear - resistant zirconia ceramics |
12 | Zirconia ceramics for oil and gas Wells and its preparation method |
13 | Zirconia ceramic cylinder material and its preparation method |
14 | Zirconia - based nano - ceramic material and its preparation method |
15 | Preparation of high thermal conductivity silicon nitride ceramics |
16 | Wear-resistant zirconia ceramics and its preparation method |
17 | Zirconia ceramic mobile phone backplate and its preparation method |
18 | A preparation method for high-density AZO target with low resistivity |
19 | A preparation method of high density and high conductivity ITO target material |
20 | Preparation method of ITO evaporation target |