| Product description |
With plasma as the heat source, high purity high density Si targets are produced from respective powders, which are heated to molten or semi-molten state and deposited on the surface of backing tube at high speeds to form dense coatings.
| Item | Specifications | Testing method |
| Purity(Si+B) (%) | ≥99.99 | |
| Density (g/cm3 ) | ≥2.2 | Archimedes densimeter |
| Impurities content (ppm) | Fe +Al+Ca：≤50 B: ≤100 O： ≤2000 N： ≤500 Total impurity (excluding O, N, B ): ≤100 | ICP Oxygen and nitrogen analyzer |
| Electrical resistivity (Ω?cm) | ≤10 | Four-probe resistivity meter |
| Dimension | |
According to customized drawings
| Backing tube | |
304/316L stainless steel (non-magnetic).
| Applications | |
Low-E glasses, electrodes of thin film solar cells, TFT-LCD, semiconductor devices.
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