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              Si Target

                  Product description


              With plasma as the heat source, high purity high density Si targets are produced from respective powders, which are heated to molten or semi-molten state and deposited on the surface of backing tube at high speeds to form dense coatings.


              Item

              Specifications

              Testing method


              Purity(Si+B) (%) 


              ≥99.99


              Density (g/cm3 )

              ≥2.2

              Archimedes densimeter

              Impurities content

              (ppm)


              Fe +Al+Ca≤50

              B:   ≤100

              O≤2000

              N≤500

              Total impurity (excluding O, N, B ): ≤100


              ICP

              Oxygen and nitrogen analyzer

              Electrical resistivity (Ω?cm)

              ≤10

              Four-probe resistivity meter

                 

              Dimension


              According to customized drawings

                 

              Backing tube 



              304/316L stainless steel (non-magnetic).

                 

              Applications



              Low-E glasses, electrodes of thin film solar cells, TFT-LCD, semiconductor devices.


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